JPS6345585B2 - - Google Patents
Info
- Publication number
- JPS6345585B2 JPS6345585B2 JP10431480A JP10431480A JPS6345585B2 JP S6345585 B2 JPS6345585 B2 JP S6345585B2 JP 10431480 A JP10431480 A JP 10431480A JP 10431480 A JP10431480 A JP 10431480A JP S6345585 B2 JPS6345585 B2 JP S6345585B2
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- layer
- sample
- evaporation source
- photoreceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011241 protective layer Substances 0.000 claims description 36
- 239000010410 layer Substances 0.000 claims description 35
- 108091008695 photoreceptors Proteins 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 5
- 150000002484 inorganic compounds Chemical class 0.000 claims description 4
- 229910010272 inorganic material Inorganic materials 0.000 claims description 4
- 229920000620 organic polymer Polymers 0.000 claims description 4
- 239000011669 selenium Substances 0.000 description 38
- 230000008020 evaporation Effects 0.000 description 21
- 238000001704 evaporation Methods 0.000 description 21
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 229910052711 selenium Inorganic materials 0.000 description 8
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 6
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 229910000967 As alloy Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 229910000584 Cl alloy Inorganic materials 0.000 description 2
- 229910001215 Te alloy Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910018110 Se—Te Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- -1 ferrocene compound Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
- G03G5/0433—Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10431480A JPS5730843A (en) | 1980-07-31 | 1980-07-31 | Electrophotographic receptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10431480A JPS5730843A (en) | 1980-07-31 | 1980-07-31 | Electrophotographic receptor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5730843A JPS5730843A (en) | 1982-02-19 |
JPS6345585B2 true JPS6345585B2 (en]) | 1988-09-09 |
Family
ID=14377461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10431480A Granted JPS5730843A (en) | 1980-07-31 | 1980-07-31 | Electrophotographic receptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5730843A (en]) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS601247A (ja) * | 1983-06-17 | 1985-01-07 | Asahi Chem Ind Co Ltd | スチレン重合体組成物 |
JPS63239459A (ja) * | 1986-11-28 | 1988-10-05 | Ricoh Co Ltd | 電子写真感光体 |
JPS6448065A (en) * | 1987-08-19 | 1989-02-22 | Ricoh Kk | Electrophotographic sensitive body |
DE69116933T2 (de) * | 1990-06-04 | 1996-07-11 | Canon Kk | Lichtempfindliches Element zur Elektrophotographie |
US5422210A (en) * | 1991-03-18 | 1995-06-06 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member and electrophotographic apparatus, device unit and facsimile machine using the same |
US5385797A (en) * | 1991-09-24 | 1995-01-31 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and electrophotographic apparatus, device unit, and facsimile machine employing the same |
US5455135A (en) * | 1992-12-18 | 1995-10-03 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member with overlayer and electrophotographic apparatus employing same |
DE69611880T2 (de) * | 1995-11-06 | 2001-08-02 | Canon K.K., Tokio/Tokyo | Elektrophotographisches lichtempfindliches Element, Prozesskassette und elektrophotographisches Gerät, unter Verwendung desselben |
DE69708732T2 (de) * | 1996-03-27 | 2002-08-08 | Canon K.K., Tokio/Tokyo | Elektrophotographisches photoempfindliches Element, elektrophotographischer Apparat und Prozesskassette unter Verwendung desselben |
US5905008A (en) * | 1996-06-05 | 1999-05-18 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge employing the same |
EP0818714B1 (en) * | 1996-07-09 | 2001-12-05 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge employing the same |
US6004710A (en) * | 1997-02-12 | 1999-12-21 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus |
US5910272A (en) * | 1997-03-19 | 1999-06-08 | Dow Corning Asia, Ltd. | Process for the preparation of an electrically conductive coating material |
JPH10319615A (ja) * | 1997-03-19 | 1998-12-04 | Dow Corning Asia Ltd | 感光体表面コーティング材の製造方法 |
US6296978B1 (en) | 1997-04-30 | 2001-10-02 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, a process-cartridge inclusive thereof, and an image forming apparatus |
KR19990053997A (ko) * | 1997-12-24 | 1999-07-15 | 이구택 | 전착도장성 및 용접성이 우수한 유기피복강판의 제조방법 |
US6258498B1 (en) | 1998-12-25 | 2001-07-10 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and process cartridge and electrophotographic photosensitive member |
-
1980
- 1980-07-31 JP JP10431480A patent/JPS5730843A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5730843A (en) | 1982-02-19 |
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